ASTM E1172-87(2001) 波長擴散X射線分光儀的描述用標準規程

1.1 This practice describes the components of a wavelength-dispersive X-ray spectrometer that are basic to its operation and to the quality of its performance. It is not the intent of this practice to specify component tolerances or performance criteria, as these are unique for each instrument. The document does, however, attempt to identify which of these are critical and thus which should be specified.1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. Specific safety hazard statements are given in 5.3.1.2 and 5.3.1.2, and in Section 7. 1.2 There are several books and publications from the National Institute of Standards and Technology and the U.S. Government Printing Office, which deal with the subject of X-ray safety. Refer also to Practice E416.

Standard Practice for Describing and Specifying a Wavelength-Dispersive X-Ray Spectrometer

ASTM E1162-87(1996) 二次離子質譜法(SIMS)中報告濺射深度截面數據

1.1 This practice covers the information needed to describe and report instrumentation, specimen parameters, experimental conditions, and data reduction procedures. SIMS sputter depth profiles can be obtained using a wide variety of primary beam excitation conditions, mass analysis, data acquisition, and processing techniques (1-4).1.2 Limitations8212;This practice is limited to conventional sputter depth profiles in which information is averaged over the analyzed area in the plane of the specimen. Ion microprobe or microscope techniques permitting lateral spatial resolution of secondary ions within the analyzed area, for example, image depth profiling, are excluded.1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)

ASTM E1172-87(2003) 波長擴散X射線分光儀的描述和規定

This practice describes the essential components of a wavelength-dispersive X-ray spectrometer. This description is presented so that the user or potential user may gain a cursory understanding of the structure of an X-ray spectrometer system. It also provides a means for comparing and evaluating different systems as well as understanding the capabilities and limitations of each instrument.1.1 This practice covers the components of a wavelength-dispersive X-ray spectrometer that are basic to its operation and to the quality of its performance. It is not the intent of this practice to specify component tolerances or performance criteria, as these are unique for each instrument. The document does, however, attempt to identify which of these are critical and thus which should be specified.1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. Specific safety hazard statements are given in 5.3.1.2 and 5.3.2.4, and in Section 7. 1.3 There are several books and publications from the National Institute of Standards Technology and the U.S. Government Printing Office which deal with the subject of X-ray safety. Refer also to Practice E416.

Standard Practice for Describing and Specifying a Wavelength-Dispersive X-Ray Spectrometer

ASTM E1172-87(1996) 波長色散X射線分光儀的描述和規定的標準規程

1.1 This practice describes the components of a wavelength-dispersive X-ray spectrometer that are basic to its operation and to the quality of its performance. It is not the intent of this practice to specify component tolerances or performance criteria, as these are unique for each instrument. The document does, however, attempt to identify which of these are critical and thus which should be specified.1.2 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. Specific safety hazard statements are given in 5.3.1.2 and 5.3.1.2, and in Section 7. 1.2 There are several books and publications from the National Institute of Standards and Technology and the U.S. Government Printing Office, which deal with the subject of X-ray safety. Refer also to Practice E416.

Standard Practice for Describing and Specifying a Wavelength-Dispersive X-Ray Spectrometer

ASTM E1162-87(2001) 二次離子質譜法(SIMS)中報告濺射深度截面數據

1.1 This practice covers the information needed to describe and report instrumentation, specimen parameters, experimental conditions, and data reduction procedures. SIMS sputter depth profiles can be obtained using a wide variety of primary beam excitation conditions, mass analysis, data acquisition, and processing techniques (1-4).1.2 Limitations8212;This practice is limited to conventional sputter depth profiles in which information is averaged over the analyzed area in the plane of the specimen. Ion microprobe or microscope techniques permitting lateral spatial resolution of secondary ions within the analyzed area, for example, image depth profiling, are excluded.1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)

GOST 4.452-1986 產品質量指標系統.測光儀.目錄術語

Настоящий стандарт устанавливает номенклатуру основных показателей фотометрических приборов, включаемых в ТЗ на НИР по определению перс

Product-quality index system. Phetometric instruments. Nomenclature of indices

JIS B 7432:1985 角度標準用光學多面棱鏡

この規格は，角度の標準として用いる多面鏡(以下，多面鏡という。)について規定する。

Optical polygons for angle standards

GOST 8.046-1985 國家測量統一性保證體系.光學分度頭.驗證方法

Настоящий стандарт распространяется на оптические делительные головки по ГОСТ 9016-77, а также на отечественные и импортные оптические дели

State system for ensuring the uniformity of measurements. Optical dividing heads. Verification methods

ISO 1878:1983 測量和評定表面光潔度幾何參數儀器和設備的分類

Classification of instruments and devices for measurement and evaluation of the geometrical parameters of surface finish

DIN 67530:1982 涂漆表面及塑料表面光澤評定用的反射計

Reflectometer as a means for gloss assessment of plane surfaces of paint coatings and plasticsZusammenhang mit der von der International Organization for Standardization (ISO) herausgegebenen Norm ISO 2813 - 1978, siehe Erl?uterungen.

Reflectometer as a means for gloss assessment of plane surfaces of paint coatings and plastics

ARMY MIL-T-49124-1977 TS-3620()型激光測距機的測試設置

This specification covers the Test Set, Laser Rangefinder,TS-3620( )/GVS-5.(See 6.4.)

TEST SET, LASER RANGEFINDER, TS-3620( )

NF F76-024:1976 鐵路固定設備.軌道設施和維護工具.聲檢測錘

Fixed railway installations. Track service and maintenance tools. Sounding hammer.

NF S12-003:1975 光學儀器.正向焦距計.規范和取樣

OPTICAL EQUIPMENT. FOCIMETERS. SPECIFICATIONS AND CALIBRATION.

ANSI N545-1975 熱致發光劑量計測定法:環境應用、性能和試驗

Thermoluminescence Dosimetry: Environmental Applications, Performance, Testing

ASTM E388-72(1998) 熒光分光計光譜帶寬和波長精度的標準測定方法

1.1 This test method covers the testing of the spectral bandwidth and wavelength accuracy of fluorescence spectrometers.

Standard Test Method for Spectral Bandwidth and Wavelength Accuracy of Fluorescence Spectrometers

GOST 8.014-1972 ГСИ.光電式照度計的檢定方法與工具

Настоящий стандарт устанавливает методы и средство первичной и периодической поверки рабочих фотоэлектрических люксметров общего назна

State system for ensuring the uniformity of measurements. Methods and means for verification of photoelectric illumination photometers